The non-contact method is used to test the bulk resistivity of semi-insulating high-resistance semiconductor wafers and to perform automatic multi-point testing to draw the volume resistivity of each region of the wafer to obtain the uniformity of the entire wafer.
XY mobile platform: 150mmΧ150mm
On the film: manual
Probe height adjustment: automatic adjustment
Vacuum slide plate: 150mm diameter, comes with a vacuum pump
Hood: The test area is equipped with a reticle
Moving speed: 40mm per second
Relocation accuracy: 10um
Measuring range: 105 ohm-cm to 1012 ohm-cm
Probe size: diameter 1mm
Repeatability:
1x106Ohm-cm - 1x109 Ohm-cm, the test data deviation is less than 1%
1x105 Ohm-cm- 1x106 Ohm-cm, test data deviation less than 10%
1x109 Ohm-cm- 1x1012 Ohm-cm, test data deviation less than 10%
To the edge of the distance: standard 5mm, minimum 2.5mm
Resistivity test time: single point, resistance at 107 ohm-cm, about 270ms, with the platform to move 1mm time
The whole piece of test time: 100mm diameter, 1mm test spacing case, about 36 minutes
