Specifically for compound semiconductor (GaN & GaAs) Automated mass production of plasma assisted chemical vapor deposition systems with small footprint, high throughput and low maintenance costs. More than 40 years experience in equipment manufacturing experience
VDS-5800SNC | VDS-5800SNC-L | ||
Wafer Charge | 2inch | 30 | 42 |
3inch | 15 | 21 | |
4inch | 9 | 12 | |
6inch | 5 | 8 | |
Suscepter | Φ527mm | Φ670mm | |
Frequency | 400kHz/13.56MHz | ||
Deposition Rate Range | 5~110nm/min | ||
Film Stress Control | Yes | ||
Uniformity | 3%以下 | ||
Up Time | 97%以上 | ||
Option | RealTime Process Monitor |