Automated Spectral Reflectometry  Metrology System

  • Product No:NanoSpec II
  • Manufacturer:Nanometrics Inc.

Extending the range and performance of the industry proven NanoSpec 6100, the NanoSpec II introduces a new design with automated sample alignment, fast autofocus, sub 1-second per site measurement time and measurement repeatability better than 1Å. For existing 6100 customers, the NanoSpec II will offer an intuitive recipe transfer system, offering full backward compatibility of all measurement recipes. The system can be incorporated with Nanometrics’ powerful NanoDiffract® spectroscopic reflectivity analysis software, image processing for automated pattern alignment and an optional robotic 200mm wafer handling system, making the NanoSpec II the most powerful thin film system in its class.


Standard Features

• Wafer Sizes: 50mm – 200mm

• Stage Control – multiple mouse click options,fully automatic recipe control

• Industrial PC / Windows 7 OS

• Flat panel Monitor

• Operations manual (CD)

• FFT thickness analysis Algorithm

• NanoDiffract® SR analysis with full stack multiple layers and optical constants variation monitoring

• Image Based Processing for automated patterned wafer alignment

• Fully automated wafer handling with up to 3 cassette station


Optional Features

• NanoStandard® film thickness standard wafer

• SECS/GEM automation interface

• NanoDiffract® SR offline analysis station

• Cleanroom operations manual (hard copy)


  

 

DUV1

VIS/NIR2

Thick Film2

Specification

Spectral range

200-800nm

450nm-1050nm

500nm-800nm

Thickness range

35Å-20μm

100nm-30μm

500nm-120μm

Spot size options

7μm/14μm

20μm/40μm

20μm/40μm

Dynamic Repeatability/Stability (1-sigma)4,5,6

3.5-10nm

<1.00Å

-

-

10nm-100nm

<0.80Å

-

-

100nm - 500nm

<0.08%

<0.10%

-

500nm - 20μm

<0.05%

<0.10%

<0.05%

20μm - 30μm

-

<0.10%

<0.05%

30μm - 120μm

-

-

<0.05%

Applications

Typical use cases

NO & ONO, gate oxides,

low k & high k, ultra thin films

aSi, pSi, thin EPI, thick oxides

resist, very thick oxides,

organic materials

Typical users

R&D, FEOL production

substrate manufacturing, MEMS

Litho, MEMS, bio/organics R&D

Throughput9

5pt

9pt

13pt

Typical Throughput

80 wph

55 wph

39 wph

Sample Applications

 

R&D

High-k dielectrics   development

The Nanospec II allows   monitoring of n&k values using a large variety of dispersion models. This   is ideal for fast & easy process setup or R&D work

low-k dielectrics   development

Thin metal & alloy’s

 

LED

 

Buffer layer thickness   such as ZnO, CdS

A large group of applications people with specialized knowledge to an industry   are able to characterize and setup material files for advanced materials

Filter Layer stacks

Nanometrics advanced modelling engine allows stable and fast multi-layer   measurements and various options for lookup models and BEMA models

Solar

CdS layer

Thickness & n&k changes can be tracked safely. Recipes can be   transferred to the TSM inline solar monitor

ZnO, SiNx, SiO2

Buffer layer   monitoring and recipe exchange to the TSM inline solar monitor

Dielectrica such as   SiO2, SiNx

The Nanospec II allows monitoring of n&k values using a large   variety of dispersion models. This is ideal for fast & easy process setup   or R&D work

MEMS / substrates

aSi/pSi

Amorphous/Polycrystalline   Si, enriched Si layers

Resist/thick films

Thick Oxide layers,   large thickness resist layers

Rough layers

Roughness on   multilayer or single layer stacks