Semiconductor FTIR Metrology System

  • Product No:QS1200
  • Manufacturer:Nanometrics Inc.

The QS-1200 is used to test the SiC epitaxial layer thickness with FilmZ and PD EPI modules, where FilmZ is used to test SiC / SiC, Si / Si, III / V, SOI, MEMS, PR Test multi-layer SiC epitaxial layer with multi-point 12inch sample stage, direct test multi-point test patterns.

  • SiC film thickness test range 2um-250um

  • SiC film thickness test accuracy 0.01um, typical value

  • SiC Film Thickness Test Repeatability (3-sigma, 10 times) 3 nm (FilmZ), 1 nm (PD EPI)

  • Conventional film thickness test range 0.5um-1000um. And materials

  • High-strength water-cooled ceramic housing Mid-infrared light source Output spectral range 9600 cm-1 -50cm-1

  • KBr beam divider, mid-infrared flux 7500-375 cm-1

  • Spectral test range 6000cm-1 - 400cm-1 (1.7 um to 25 um)

  • Spectral resolution 0.5 cm-1 - 32 cm-1

  • Signal to noise ratio 50000: 1

  • Test time single point less than 5s

  • 300mm multi-point test platform system software directly generate multi-point mapping, 2D and 3D graphics

  • Compatible with small size 2-8inch

  • Michelson interferometer, 60 ° air bearing structure

  • Splitter 2.25inch diameter

  • Incidence angle of 30 degrees