Automated Spectral Reflectometry  Metrology System

  • Product No:NanoSpec II
  • Manufacturer:Nanometrics Inc.

Extending the range and performance of the industry proven NanoSpec 6100, the NanoSpec II introduces a new design with automated sample alignment, fast autofocus, sub 1-second per site measurement time and measurement repeatability better than 1Å. For existing 6100 customers, the NanoSpec II will offer an intuitive recipe transfer system, offering full backward compatibility of all measurement recipes. The system can be incorporated with Nanometrics’ powerful NanoDiffract® spectroscopic reflectivity analysis software, image processing for automated pattern alignment and an optional robotic 200mm wafer handling system, making the NanoSpec II the most powerful thin film system in its class.

Optional Features 

 • UV wavelength range option with 15X lens 

 • 30nm - 120µm Thick Film Option – includes high resolution 430-730 nm spectrometer with 15X lens & 20µm spot 

 • NanoDiffract SR analysis with full stack multiple layers and optical constants variation monitoring 

 • Matrox-based image processing for automated pattern wafer alignment 

 • Cleanroom operations manual (hard copy) 

 • NanoStandard® film thickness standard wafer (6- or 8-inch)

  • Spectral range 200nm - 800nm

  • Film thickness test range 35Å-20um

  • Spot size 14um

  • Film thickness test dynamic repeatability

  • 3.5-10nm <1Å

  • 10nm-100nm <0.8Å

  • 100 nm-500 nm <0.08%

  • 500nm-20um <0.05%

  • Film thickness test accuracy

  • 100-200Å ± 5Å

  • 300Å-1um ± 0.5%

  • 1um-20um ± 0.2%

  • Reflectivity accuracy

  • 248nm ± 0.5%

  • 365nm ± 0.5%

  • 633nm ± 0.5%