Plasma CVD System

  • Product No:VDS-5800 Series
  • Manufacturer:JAPAN PRODUCTION & ENGINEERING LABORATORIES INC.

Specifically for compound semiconductor (GaN & GaAs) Automated mass production of plasma assisted chemical vapor deposition systems with small footprint, high throughput and low maintenance costs. More than 40 years experience in equipment manufacturing experience

VDS-5800SNC

VDS-5800SNC-L

Wafer Charge

2inch

30

42

3inch

15

21

4inch

9

12

6inch

5

8

Suscepter

Φ527mm

Φ670mm

Frequency

400kHz/13.56MHz

Deposition Rate Range

5110nm/min

Film Stress Control

Yes

Uniformity

3%以下

Up Time

97%以上

Option

RealTime Process   Monitor